Wafer‐Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows

Metasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The are targeted infrared (IR) reflectivity emissivity characteristics bandwidths across the two atmospheric windows IR spectrum. wafers demonstrate high uniformity of optical response tailored around 50% 3–5 µm mid-wave band less than 10% 8–13 long-wave band. article furthermore shows that design principle allows achieving wide range dual-band values using single underlying materials stack, offering versatile platform. proposed approach is compatible CMOS-compatible mass-production manufacturing brings coatings closer commercially relevant scalable technology.